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MANUFACTURING METHOD OF ZINC OXIDE THIN FILM USING GROUP III SALT AND OXIDATION ZINC THIN FILM MANUFACTURED BY THE SAME CAPABLE OF PROVIDING EXCELLENT OPTICAL AND ELECTRICAL PROPERTIES TO OXIDIZED ZINC THIN FILM
MANUFACTURING METHOD OF ZINC OXIDE THIN FILM USING GROUP III SALT AND OXIDATION ZINC THIN FILM MANUFACTURED BY THE SAME CAPABLE OF PROVIDING EXCELLENT OPTICAL AND ELECTRICAL PROPERTIES TO OXIDIZED ZINC THIN FILM
PURPOSE: A manufacturing method of zinc oxide thin film using group III salt and oxidation zinc thin film manufactured by the same are provided to manufacture oxidized zinc thin film having a plurality of nano-rods with high aspect ratio.;CONSTITUTION: A manufacturing method of zinc oxide thin film using group III salt comprises the following steps: providing a solution for zinc oxide hydrothermal synthesis including the group III sa placing a substrate(10) in the solution for zinc oxide hydrothermal synthesis; and growing the oxidation zinc thin film(30) by heating the solution for zinc oxide hydrothermal synthesis. The oxidized zinc thin film includes a plurality of nano-rods grown up in the upper direction of the substrate. The nano-rods have the aspect ratio of 5-20. The group III salt which is included in the solution for zinc oxide hydrothermal synthesis includes one or more of Al, Ga and In.;COPYRIGHT KIPO 2013
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