DIRECT LASER LITHOGRAPHY DEVICE AND DIRECT LASER LITHOGRAPHY METHOD

摘要

Provided is a direct laser lithography device capable of reducing errors and increasing processing rate. Moreover, provided is a direct laser lithography method. According to one aspect of the present invention, the direct laser lithography device comprises: a polygonal scanner rotatably installed and having a polygonal cross-section; a stage where processing objects are positioned; a stage control part transferring the stage; a first error measurement part measuring errors in transfer of the stage; and a laser modulator turning on or off laser pulses and compensating errors by controlling the on/off modes of the laser pulses based on signals transmitted from the first error measurement part.;COPYRIGHT KIPO 2017