首页> 外国专利> DMD EXPOSURE OPTICS FOR ADJUSTING DIRECTION OF IRRADIATING LIGHT INCIDENT ON DIGITAL MICROMIRROR DEVICE AND LIGHT ILLUMINATION OPTICS THEREOF

DMD EXPOSURE OPTICS FOR ADJUSTING DIRECTION OF IRRADIATING LIGHT INCIDENT ON DIGITAL MICROMIRROR DEVICE AND LIGHT ILLUMINATION OPTICS THEREOF

机译:DMD曝光光学器件,用于调节数字微镜设备上的照射光入射方向及其光照明光学器件

摘要

The present invention relates to an exposure optical system capable of controlling the direction of radiating light radiated to a digital micromirror device (DMD) and a light radiating optical system forming the same. According to the present invention, the light radiating optical system includes: a light source; a first prism including a first reflection surface reflecting light radiated from the light source at a first angle, wherein the first prism also includes a second reflection surface reflecting the light reflected from the first reflection surface at a second angle by being installed to be parallel to the first reflection surface or to have a predetermined angle to the first reflection surface on a radiating path of the light reflected from the first reflection surface; and a second prism including a third reflection surface reflecting the light passing through the first prism at a third angle, wherein the second prism also includes a fourth reflection surface to which the DMD receiving output light passing through the third reflection surface is attached, wherein at least a side of the fourth reflection surface is folded on the third reflection surface. According to the present invention, the light radiating optical system can selectively design the direction of the radiated light radiated to the DMD by controlling an arrangement direction and the shape of a three-dimensional prism and can control the direction of the radiated light by rotating an upper or lower prism after the arrangement as the light radiating optical system uses a rotating prism.
机译:曝光光学系统和光辐射光学系统技术领域本发明涉及一种能够控制辐射到数字微镜装置(DMD)的辐射光的方向的曝光光学系统以及形成该曝光光学系统的光辐射光学系统。根据本发明,光辐射光学系统包括:光源;第一棱镜,包括第一反射面,该第一反射面以第一角度反射从光源发出的光,其中,第一棱镜还包括第二反射面,该第二反射面通过与第二反射面平行地安装,以第二角度反射从第一反射面反射的光。第一反射面或在从第一反射面反射的光的辐射路径上与第一反射面具有预定角度;第二棱镜,包括第三反射面,该第三反射面以第三角度反射通过第一棱镜的光,其中第二棱镜还包括第四反射面,DMD接收通过第三反射面的输出光,该第四反射面被附接至第三棱镜。第四反射面的至少一侧折叠在第三反射面上。根据本发明,光辐射光学系统可以通过控制三维棱镜的排列方向和形状来选择性地设计辐射到DMD的辐射光的方向,并且可以通过旋转光轴来控制辐射光的方向。布置为光发射光学系统后的上棱镜或下棱镜使用旋转棱镜。

著录项

  • 公开/公告号KR20190032015A

    专利类型

  • 公开/公告日2019-03-27

    原文格式PDF

  • 申请/专利权人 LEETECH CO. LTD.;

    申请/专利号KR20170120413

  • 发明设计人 PARK JING SEO;LEE SOO JIN;LEE HYUNG KU;

    申请日2017-09-19

  • 分类号G03F7/20;

  • 国家 KR

  • 入库时间 2022-08-21 11:51:20

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