Innovative Technologies for Maskless Lithography and Non-Conventional Patterning

摘要

Collaborative research was conducted by the faculty known as the Lithography Network. This network brings together world class researchers over a broad set of technology areas essential to the success of maskless lithography and non-conventional patterning. The primary faculty by task is listed below: Task 1: Electron Beam Technology for Maskless Lithography, Professor R. Fabian Pease (Coordinator); Task 2: Spatial Light Modulators for Maskless lithography, Professor Olav Solgaard (Coordinator); Professor Andrew Neureuther; Task 3: Maskless Droplet-On-Demand (DoD) Systems. Professor Vivek Subramanian (Coordinator), Professor Jeffrey Bokhor; Task 4: Advanced Materials for Maskless Lithography, Professor C. Grant Willson (Coordinator), Professor Jean Frechet; Task 5: Characterization of Nanoscale Phenomena for Maskless Lithography, Professor Andrew R. Neureuther (Coordinator); Task 6: Data Compression and Path Issues for Maskless Lithography, Professor Avideh Zakhor (Coordinator).