首页> 外国专利> MASKLESS LITHOGRAPHY SYSTEM FOR FORMING GRAY SCALE PATTERN ON OBJECT AND METHOD FOR FORMING GRAY SCALE PATTERN ON OBJECT BETWEEN MASKLESS LITHOGRAPHY

MASKLESS LITHOGRAPHY SYSTEM FOR FORMING GRAY SCALE PATTERN ON OBJECT AND METHOD FOR FORMING GRAY SCALE PATTERN ON OBJECT BETWEEN MASKLESS LITHOGRAPHY

机译:在对象上形成灰度图案的无掩膜光刻系统和在对象之间形成灰度图案的方法

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a better gray scale pattern by using relatively less pulses (for example, 2 to 4 pulses) at each feature.;SOLUTION: An exposure light pattern having spatially changeable intensity is formed by illuminating light on an array of a spatial light modulator and patterning the light with SLM, the patterned light is written on the object and the gray-scaled pattern is formed on the object based on the above-mentioned spatially changeable intensity.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种通过在每个特征上使用相对较少的脉冲(例如2至4个脉冲)来形成更好的灰度图案的方法。解决方案:通过照射光形成具有空间可改变强度的曝光光图案。在空间光调制器的阵列上并使用SLM对光进行图案化后,基于上述空间可改变的强度,将图案化的光写入对象上,并在对象上形成灰度图案.COPYRIGHT:(C) 2005,日本特许厅

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