Optical near-field and thermal nanolithography using organic dry developing photoresist

摘要

A combination of new organic photoresist films based on naphthoquinone with a conventional AFM using a tapered fibre tip as a near-field source enables the development of 'real time' dry process nano-lithography. The methodology of the adaptation of these films as well as the system configuration for a nano-scale fabrication will be described. Using these materials the exposure can be performed either by the optical near field or nano-thermal effect to achieve positive or negative lithography. Sub-wavelength gratings fabricated using this system with a variable line width down to 45 nm will be demonstrated.