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首页> 外文期刊>Nanotechnology >Large field enhancement at electrochemically grown quasi-1D Ni nanostructures with low-threshold cold-field electron emission
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Large field enhancement at electrochemically grown quasi-1D Ni nanostructures with low-threshold cold-field electron emission

机译:具有低阈值冷场电子发射的电化学生长准1D Ni纳米结构的大场增强

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摘要

Ni nanorod arrays have been vertically grown on a Ta-coated Si substrate via an electrodeposition process through the nanopores of a porous alumina membrane. Field emission studies of the samples are performed which show a considerable low-threshold field around 5 V μm-1. The field emission mechanism followed Fowler-Nordheim tunneling due to large field enhancement at the emitter tips. Low-dimensional structures of the nanorod tips provided the large geometrical field enhancement and thus produce a high enough local or barrier field for low-threshold cold-field electron emission. The cost-effective synthesis of vertically aligned Ni nanorods on an Si substrate and low-threshold field emission properties can provide a potential alternative to conventional carbon-based field emitters for low power panel applications.
机译:Ni纳米棒阵列已经通过多孔氧化铝膜的纳米孔通过电沉积工艺在Ta包覆的Si衬底上垂直生长。样品的场发射研究表明,在5 Vμm-1附近有相当低的阈值场。由于发射极尖端的大场增强,场发射机制遵循Fowler-Nordheim隧穿。纳米棒尖端的低维结构提供了较大的几何场增强,因此产生了足够高的局部场或势垒场,用于低阈值冷场电子发射。硅基板上垂直排列的Ni纳米棒的高性价比合成和低阈值场发射特性可为低功率面板应用提供常规碳基场发射器的潜在替代品。

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