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首页> 外文期刊>Nanotechnology >The fabrication of highly uniform ZnO/CdS core/shell structures using a spin-coating-based successive ion layer adsorption and reaction method
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The fabrication of highly uniform ZnO/CdS core/shell structures using a spin-coating-based successive ion layer adsorption and reaction method

机译:使用基于旋涂的连续离子层吸附和反应方法制备高度均匀的ZnO / CdS核/壳结构

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We developed a successive ion layer adsorption and reaction method based on spin-coating (spin-SILAR) and applied the method to the fabrication of highly uniform ZnO/CdS core/shell nanowire arrays. Because the adsorption, reaction, and rinsing steps occur simultaneously during spin-coating, the spin-SILAR method does not require rinsing steps between the alternating ion adsorption steps, making the growth process simpler and faster than conventional SILAR methods based on dip-coating (dip-SILAR). The ZnO/CdS core/shell nanowire arrays prepared by spin-SILAR had a denser and more uniform structure than those prepared by dip-SILAR, resulting in the higher power efficiency for use in photoelectrochemical cells.
机译:我们开发了一种基于旋涂的连续离子层吸附和反应方法(spin-SILAR),并将该方法应用于高度均匀的ZnO / CdS核/壳纳米线阵列的制造。由于在旋涂过程中吸附,反应和漂洗步骤同时发生,因此Spin-SILAR方法不需要在交替的离子吸附步骤之间进行漂洗步骤,从而使生长过程比传统的基于浸涂的SILAR方法更简单,更快速( dip-SILAR)。自旋SILAR制备的ZnO / CdS核/壳纳米线阵列比dip-SILAR制备的ZnO / CdS核/壳纳米线阵列具有更致密和更均匀的结构,从而导致用于光电化学电池的功率效率更高。

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