...
首页> 外文期刊>Nanotechnology >Sub-10 nanometre fabrication: molecular templating, electron-beam sculpting and crystallization of metallic nanowires
【24h】

Sub-10 nanometre fabrication: molecular templating, electron-beam sculpting and crystallization of metallic nanowires

机译:低于10纳米的制造:分子模板,电子束雕刻和金属纳米线的结晶

获取原文
获取原文并翻译 | 示例
           

摘要

Homogeneous metallic nanowires with diameters below 10 nm are produced by sputter coating suspended DNA molecules and/or carbon nanotubes. A fabrication method is described that allows 'e-beam nanosculpting', i.e. local modification of the shape of nanowires, with a resolution of similar to 3 nm. The process is performed with a focused electron beam (e-beam) in a transmission electron microscope, under direct visual control. We also demonstrate that e-beam radiation can induce local crystallization of nanowires. This method could be used to fabricate novel electronic devices, e.g. single-electron tunnelling transistors, with dimensions below 10 nm, possibly operating at room temperature.
机译:通过溅射涂覆悬浮的DNA分子和/或碳纳米管,可以生产直径低于10 nm的均质金属纳米线。描述了一种制造方法,其允许“电子束纳米雕刻”,即局部修饰纳米线的形状,其分辨率类似于3nm。在直接可视控制下,在透射电子显微镜中使用聚焦电子束(电子束)执行该过程。我们还证明了电子束辐射可以诱导纳米线的局部结晶。该方法可用于制造新颖的电子设备,例如。尺寸低于10 nm的单电子隧穿晶体管,可能在室温下运行。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号