Epitaxial growth of ZnO layers using nanorods with high crystalline quality

摘要

Epitaxial ZnO films were grown on c-plane sapphire substrates by metal-organic chemical vapor deposition using a ZnO multi-dimensional structure having the sequence of ZnO film/ZnO nanorods/sapphire. The vertically well-aligned one-dimensional ZnO nanorods were grown epitaxially on the sapphire substrate with in-plane alignment under suitable growth conditions and then used as seeds for the subsequent epitaxial ZnO layer. For the transition of the ZnO structures from the nanorods to the film, the growth temperature and working pressure were controlled, while keeping the other conditions fixed. The growth of the ZnO films on the well-aligned ZnO nanorods results in homoepitaxial growth with the identical orientation relationship along the in-plane direction as well as the same c-axis orientation. The microstructural analysis of the multi-dimensional structure and analysis of the microstructural evolution from the one-dimensional nanorods to the two-dimensional film were conducted using transmission electron microscopy.