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Interface study on heterostructured GaP-GaAs nanowires

机译:GaP-GaAs异质结构纳米线的界面研究

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摘要

The interface chemical composition of heterostructured GaP-GaAs nanowire segments was studied by the use of energy-dispersive x-ray analysis. An arsenic-rich tail in the GaP segments following GaAs could be minimized by reducing the AsH_3 molar fraction and the growth rate. For the temperature regime used for vapour-liquid-solid growth, we observe the opposite trend on interface sharpness compared to high-temperature layer-by-layer growth, that is, the sharpness of the interface improves with reducing temperature.
机译:通过使用能量色散x射线分析研究了异质结构GaP-GaAs纳米线片段的界面化学组成。通过减少AsH_3摩尔分数和生长速率,可以使GaAs之后GaP段中富砷尾巴最小化。对于用于蒸气-液体-固体生长的温度范围,与高温逐层生长相比,我们观察到界面锐度的相反趋势,即,界面锐度随温度降低而提高。

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