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Size-and doping-dependent time-resolved photoluminescence of doped Si nanocrystals

机译:掺杂Si纳米晶体的尺寸和掺杂相关的时间分辨光致发光

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摘要

Time-resolved photoluminescence (PL) has been studied for B-and Sb-doped Si nanocrystals (NCs) fabricated by ion beam sputtering and annealing. For B-doped Si NCs, the PL intensity as well as the PL lifetime (τ_(PL)) increases as NC size (d) varies from 1.5 to 2.6nm, similar to the case for undoped Si NCs, but with further increase of d, they decrease, possibly resulting from the increase of optically less active NCs with the increase of NCs containing more dopants. The PL intensity and τ_(PL) monotonically decrease with increasing doping concentration (nD), irrespective of doping element. Si NCs show smaller τ_(PL) in B doping than in Sb doping over the full range of n_D. The sharp decrease in PL intensity, accompanied by the gradual decrease in τ_(PL) for the higher n_D of Sb, may be attributed to Auger recombination due to the presence of Sb inside Si NCs. The higher PL quench rate by Sb compared to B could be attributed to better ionization of Sb dopants in Si NCs.
机译:已经研究了通过离子束溅射和退火制备的B和Sb掺杂的Si纳米晶体(NC)的时间分辨光致发光(PL)。对于掺杂B的Si NC,与未掺杂的Si NC相似,随着NC尺寸(d)从1.5到2.6nm变化,PL强度和PL寿命(τ_(PL))也会增加。 d,它们减少,可能是由于光学活性较低的NCs随含更多掺杂剂的NCs的增加而增加。 PL强度和τ_(PL)随掺杂浓度(nD)的增加而单调降低,而与掺杂元素无关。在整个n_D范围内,Si NCs在B掺杂中的τ_(PL)比在Sb掺杂中的小。 PL强度的急剧下降,伴随着更高的Sb n_D的τ_(PL)的逐渐降低,可能归因于Si NCs内部Sb的存在导致俄歇复合。与B相比,Sb的PL猝灭速率更高,可以归因于Si NCs中Sb掺杂物的更好电离。

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