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An atomically resolved study of InGaAs quantum dot layers grown with an indium flush step

机译:通过铟冲洗步骤生长的InGaAs量子点层的原子解析研究

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摘要

In this cross-sectional scanning tunnelling microscopy study we investigate the indium flush method as a means to control the height of self-assembled InGaAs quantum dots and wetting layers. The results show that application of an indium flush step during growth results in flattened dots and a reduced wetting layer of which the height can be precisely controlled by varying the height of the first capping layer.
机译:在此横截面扫描隧道显微镜研究中,我们研究了铟冲洗法,以控制自组装InGaAs量子点和润湿层的高度。结果表明,在生长过程中应用铟冲洗步骤会导致扁平的点和减少的润湿层,可以通过改变第一覆盖层的高度来精确控制其高度。

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