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Fabrication and testing of freestanding Si nanogratings for UV filtration on space-based particle sensors

机译:用于空间粒子传感器上用于紫外线过滤的独立式硅纳米光栅的制备和测试

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摘要

We demonstrate complete fabrication process integration and device performance of sturdy,self-supported transmission gratings in silicon. Gratings are patterned with nanoimprint lithography and aluminum liftoff on silicon-on-insulator wafers. Double-sided deep reactive ion etching (DRIE) creates freestanding 120 nm half-pitch gratings with 2000 nm depth and built-in 1 mm pitch bulk silicon support structures. Optical characterization demonstrates 10~(-4) transmission of UV in the 190–250 nm band while a 25–30% geometric transparency allows particles to pass unimpeded for space plasma measurements.
机译:我们演示了坚固的自支撑硅传输光栅的完整制造工艺集成和器件性能。用纳米压印光刻和在绝缘体上硅晶片上的铝剥离图案化光栅。双面深反应离子刻蚀(DRIE)可创建深度为2000 nm的独立式120 nm半节距光栅和内置的1 mm节距大块硅支撑结构。光学表征表明,在190–250 nm波段中,紫外线可以10〜(-4)透射,而25–30%的几何透明性可以使粒子不受阻碍地通过,从而进行空间等离子体测量。

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