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Kelvin probe force microscopy for conducting nanobits of NiO thin films

机译:开尔文探针力显微镜用于传导纳米位的NiO薄膜

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摘要

We demonstrated the writing and reading of conducting nanobits on a NiO thin film deposited on Pt/TiO_2/SiO_2/Si substrates for a resistive random access memory (RRAM) application using conducting atomic force microscopy (CAFM) and Kelvin probe force microscopy (KFM). A Pt/NiO/Pt RRAM capacitor showed a typical unipolar switching behavior with bistable resistances. Conducting nanobits with diameters of 22nm written with a bias of 3.0V on the NiO thin film were observed with CAFM. The conducting nanobits observed by KFM exhibited negative potentials relative to the insulating regions when there was no bias at the Pt bottom electrode because image charges were induced by charges formed at the end of the KFM tip by the reference AC bias. Enhancement of the KFM signals for conducting nanobits was achieved using specific biases at the Pt bottom electrode, which provided clear KFM images for conducting nanobits.
机译:我们使用导电原子力显微镜(CAFM)和开尔文探针力显微镜(KFM)演示了在Pt / TiO_2 / SiO_2 / Si衬底上沉积的NiO薄膜上的导电纳米位的写入和读取,用于电阻随机存取存储器(RRAM)应用。 Pt / NiO / Pt RRAM电容器显示出典型的单极性开关行为和双稳态电阻。用CAFM观察到直径为22nm的纳米位,在NiO薄膜上以3.0V的偏压写入。当在Pt底部电极上没有偏压时,通过KFM观察到的导电纳米位相对于绝缘区域表现出负电势,因为图像电荷是由参考AC偏压在KFM尖端的末端形成的电荷引起的。通过在Pt底部电极处使用特定的偏压,可以增强用于传导纳比特的KFM信号,从而为传导纳比特提供清晰的KFM图像。

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