A new process for fabricating nanodot arrays on selective regions with diblock copolymer thin film

摘要

A procedure for micropatterning a single layer of nanodot arrays in selective regions is demonstrated by using thin films of polystyrene-b-poly(t-butyl acrylate) (PS-b-PtBA) diblock copolymer. The thin-film self-assembled into hcxagonally arranged PtBA nanodomains in a PS matrix on a substrate by solvent annealing with 1,4-dioxane. The PtBA nanodomains were converted into poly (acrylic acid) (PAA) having carboxylic-acid-functionalized nanodomains by exposure to hydrochloric acid vapor, or were removed by ultraviolet (UV) irradiation to generate vacant sites without any functional groups due to the elimination of PtBA domains. By sequential treatment with aqueous sodium bicarbonate and aqueous zinc acetate solution, zinc cations were selectively loaded only on the carboxylic-acid-functionalized nanodomains prepared via hydrolysis. Macroscopic patterning through a photomask via UV irradiation, hydrolysis, sequential zinc cation loading and calcination left a nanodot array of zinc oxide on a selectively UV-shaded region.