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Epitaxial growth and microstructure of CU_2O nanoparticle/thin films on SrTiO_3(100)

机译:SrTiO_3(100)上CU_2O纳米/薄膜的外延生长和微观结构。

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摘要

Cuprous oxide (Cu_2O) was grown on SrTiO_3 (STO)(100) by oxygen plasma-assisted molecular-beam epitaxy. The microstructure of the grown layer and the Cu valence state were analysed using x-ray diffraction (XRD), x-ray photo-electron spectroscopy (XPS), atomic force microscopy (AFM) and cross-sectional transmission electron microscopy (TEM) as well as electron diffraction. The grown layer was dominated by the Cu_2O phase, posseting an epitaxial orientation of Cu_2O(001) || STO(001) and Cu(100) || STO(100) with respect to the substrate. The morphology of the Cu_2O film shows a dependence on the growth rate. Typically, fast growth will lead to the formation of a thin film with a relatively smooth surface. Slow growth will lead to the development of nanoparticles, featuring the formation of Cu_2O pyramids. The pyramids are invariantly defined by the Cu_2O {111} planes. Given the fact that the {111} planes correspond to the lowest surface energy of Cu_2O, slow growth will give the system enough time to allow it to adopt the pyramid configuration by which the overall energy of the system is minimized.
机译:通过氧等离子体辅助分子束外延在SrTiO_3(STO)(100)上生长氧化亚铜(Cu_2O)。使用x射线衍射(XRD),x射线光电子能谱(XPS),原子力显微镜(AFM)和截面透射电子显微镜(TEM)分析生长层的微观结构和Cu价态以及电子衍射。生长的层以Cu_2O相为主,Cu_2O(001)||的外延取向为准。 STO(001)和Cu(100)||相对于基板的STO(100)。 Cu_2O膜的形貌表现出对生长速率的依赖性。通常,快速生长将导致形成具有相对光滑表面的薄膜。缓慢的生长将导致纳米颗粒的发展,其特征是形成了Cu_2O金字塔。金字塔始终由Cu_2O {111}平面定义。鉴于{111}平面对应于Cu_2O的最低表面能这一事实,缓慢的生长将为系统提供足够的时间,使其能够采用金字塔结构,从而使系统的总能量最小化。

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