High yield synthesis and lithography of silica-based nanospring mats

摘要

In this study we report a novel technology for synthesizing silica-based nanosprings with a yield higher than 90 percent, and with 100 percent repeatability. The nanospring mats are grown via the liquid-vapour-solid mechanism using a gold catalyst, where the deposition temperature can be as low as 350 deg C. XPS analysis shows that the as-grown nanosprings have components of silicon and oxygen with an atomic ratio close to silica. Both SEM and TEM images illustrate that the helical structure of the nanosprings is extremely uniform. Two types of nanosprings are observed using TEM. The first type of silica nanospring is formed from a single nanowire, whereas the second type consists of multiple intertwined nanowires. Patterned deposition of nanosprings has been achieved using this technology.