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Effect of doping- and field-induced charge carrier density on the electron transport in nanocrystalline ZnO

机译:掺杂和场致载流子密度对纳米ZnO中电子输运的影响

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摘要

The charge transport properties of thin films of sol-gel processed undoped and Al-doped zinc oxide nanoparticles with variable doping level between 0.8 and 10 at.% were investigated. The x-ray diffraction studies revealed a decrease of the average crystallite sizes in highly doped samples. We provide estimates of the conductivity and the resulting charge carrier densities with respect to the doping level. The increase of charge carrier density due to extrinsic doping was compared to the accumulation of charge carriers in field effect transistor structures. This allowed us to assess the scattering effects due to extrinsic doping on the electron mobility. The latter decreases from 4.6 x 10(-3) to 4.5 x 10(-4) cm(2) V-1 s(-1) with increasing doping density. In contrast, the accumulation leads to an increasing mobility up to 1.5 x 10(-2) cm(2) V-1 s(-1). The potential barrier heights related to grain boundaries between the crystallites were derived from temperature dependent mobility measurements. The extrinsic doping initially leads to a grain boundary barrier height lowering, followed by an increase due to doping-induced structural defects. We conclude that the conductivity of sol - gel processed nanocrystalline ZnO:Al is governed by an interplay of the enhanced charge carrier density and the doping-induced charge carrier scattering effects, achieving a maximum at 0.8 at.% in our case.
机译:研究了溶胶-凝胶法处理的未掺杂和Al掺杂的氧化锌纳米粒子的薄膜的电荷传输性质,该掺杂浓度在0.8和10 at。%之间。 X射线衍射研究表明,高掺杂样品中平均微晶尺寸减小。我们提供了有关掺杂水平的电导率和所得电荷载流子密度的估计值。将由于非本征掺杂而导致的载流子密度的增加与场效应晶体管结构中的载流子的积累进行了比较。这使我们能够评估由于非本征掺杂对电子迁移率的散射效应。随着掺杂密度的增加,后者从4.6 x 10(-3)减少到4.5 x 10(-4)cm(2)V-1 s(-1)。相反,积累导致迁移率增加到1.5 x 10(-2)cm(2)V-1 s(-1)。与晶粒之间的晶界有关的势垒高度是从与温度有关的迁移率测量值中得出的。外部掺杂最初导致晶界势垒高度降低,随后由于掺杂引起的结构缺陷而增加。我们得出的结论是,溶胶-凝胶处理的纳米晶体ZnO:Al的电导率受增强的电荷载流子密度与掺杂诱导的电荷载流子散射效应相互作用的影响,在我们的情况下,最大值达到0.8 at。%。

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