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Cost-effective production of highly regular nanostructured metallization layers

机译:经济高效地生产高度规则的纳米结构金属化层

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In this paper we describe how the effect of irradiation- and strain-induced surface processing of elastomer surfaces (Katzenberg 2001 Macromol. Mater: Eng. 286 26) can be exploited for production of highly regular nanostructured metallization layers. Poly(dimethyl siloxane) elastomer was treated under one-dimensional strain by an argon plasma to exhibit highly oriented surface undulations with nearly uniform periods and amplitudes. The microstructured silicone surface topography was evaporated under a tilt angle of 45 deg with platinum and subsequently mechanically strained up to 30 percent. This treatment results in the formation of platinum ribbons or rods with a width which is similar to the wavelength of the silicone surface undulations. The gaps between the rods can be reproducibly tuned by strain of the silicone substrate between a few um up to some 100 nm. To fix a special gap width between a set of nanorods arranged in parallel, the metallization on top of the silicone can be transferred completely to another polymer support.
机译:在本文中,我们描述了如何利用辐射和应变诱导的弹性体表面的表面处理效果(Katzenberg 2001 Macromol。Mater:Eng。286 26)可用于生产高度规则的纳米结构化金属化层。聚(二甲基硅氧烷)弹性体在一维应变下通过氩气等离子体处理,显示出高度取向的表面起伏,周期和振幅几乎均匀。微结构化的有机硅表面形貌与铂在45度倾斜角下蒸发,随后机械变形达30%。这种处理导致形成的铂带或棒的宽度类似于硅酮表面起伏的波长。棒之间的间隙可以通过硅基板在几微米到大约100 nm之间的应变而可重复地调整。为了在平行排列的一组纳米棒之间固定特殊的间隙宽度,可以将有机硅顶部的金属化层完全转移到另一个聚合物载体上。

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