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首页> 外文期刊>Nanotechnology >Hot-electron relaxation via optical phonon emissions in GaAs/Al_xGa_(1-x)As quantum well structures: dependence upon the alloy composition and barrier width
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Hot-electron relaxation via optical phonon emissions in GaAs/Al_xGa_(1-x)As quantum well structures: dependence upon the alloy composition and barrier width

机译:GaAs / Al_xGa_(1-x)As量子阱结构中通过光子发射产生的热电子弛豫:取决于合金成分和势垒宽度

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摘要

We present a systematic investigation of the dependence of the hot-electron-optical-phonon interactions on Al composition and barrier width in GaAs/Al_xGa_(1-x) As MQW structures. Raman scattering measurements at 15 K are presented for samples with different barrier widths and Al composition. The optical phonon energies emitted by the photoexcited electrons in quantum wells were also determined by using hot-electron-neutral acceptor luminescence techniques. It is shown that the relaxation of hot electrons in the quantum wells is dominated by the GaAs LO phonon emission for small x, but by AlAs-like LO phonons for larger Al composition. For samples with larger barriers, the electrons in the GaAs layer relax mostly through the AlAs-like optical phonon emission. However, in samples with smaller barriers, the relaxation of hot electrons is dominated by the GaAs optical phonon emission.
机译:我们目前对GaAs / Al_xGa_(1-x)As MQW结构中热电子-声子-声子相互作用对Al组成和势垒宽度的依赖性进行系统研究。给出了具有不同势垒宽度和Al成分的样品在15 K下的拉曼散射测量结果。还使用热电子中性受体发光技术确定了量子阱中光激发电子发射的光子能量。结果表明,对于较小的x,量子阱中热电子的弛豫主要由GaAs LO声子发射决定,而对于较大的Al组成,则由AlAs类LO声子决定。对于具有较大势垒的样品,GaAs层中的电子主要通过类似AlAs的光声子发射而弛豫。然而,在具有较小势垒的样品中,热电子的弛豫主要由GaAs光学声子发射引起。

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