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InGaAsN/GaAs heterostructures for long-wavelength light-emitting devices

机译:用于长波长发光器件的InGaAsN / GaAs异质结构

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摘要

We report on the growth and properties of InGaAsN/GaAs heterostructures and on their applications for lasers emitting at #lambda# ≈ 1.3 #mu#m. Material growth was performed by molecular beam epitaxy using an RF plasma source. Broad area and ridge waveguide (RWG) laser structures based on such quantum wells (QWs) exhibit performances that can compete with those of 1.3 #mu#m InGaAsP lasers. In particular, we have achieved 300 K operation of broad area lasers at 1.3 #mu#m with threshold current densities down to 500 and 650 A cm~(-2) for 800 #mu#m long, single and triple QW structures. Similar structures with heat-sinking at 10deg C yield a maximum CW output power of up to 8 W. RWG lasers have thresholds down to 11 mA and show CW operation up to 100deg C with a T_0 of up to 110 K.
机译:我们报告了InGaAsN / GaAs异质结构的生长和性质,以及它们在#lambda#≈1.3#mu#m发射的激光中的应用。使用RF等离子源通过分子束外延进行材料生长。基于此类量子阱(QW)的广域和脊形波导(RWG)激光器结构表现出的性能可与1.3#μmInGaAsP激光器相媲美。特别地,对于800#mu#m长的单QW结构和三重QW结构,我们已经实现了在1.3#mu#m的300 K宽波长激光器的工作,阈值电流密度低至500和650 A cm〜(-2)。具有10°C散热的类似结构可产生高达8W的最大CW输出功率.RWG激光器的阈值低至11mA,并且显示CW的工作温度高达100°C,T_0高达110K。

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