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Optimization of multi-walled carbon nanotube-metal contacts by electrical stressing

机译:通过电应力优化多壁碳纳米管与金属的接触

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摘要

We present experimental data on the contact resistances of three different metal probes, tungsten, palladium and indium, with chemical vapour deposited (CVD) multi-wall carbon nanotubes (MWCNTs). We demonstrate that there is an irreversible modification of the contacts following electrical stressing whereby the circuit resistance converges towards its optimal value prior to current-induced tube failure. Once the probe-MWCNT contact is broken, subsequent recontact experiments reveal that the circuit resistance returns to its initial high level, demonstrating that the modification occurs at the probe contact location and not elsewhere in the circuit. Contact studies with the different metals reveal that Pd metal provides the lowest resistance contact to the MWCNT in our sample.
机译:我们提供了关于三种不同金属探针(钨,钯和铟)与化学气相沉积(CVD)多壁碳纳米管(MWCNT)的接触电阻的实验数据。我们证明,在电应力作用下,触头会发生不可逆的变化,从而在电流引起的管失效之前,电路电阻会朝其最佳值收敛。一旦探针与MWCNT的接触断开,随后的重新接触实验就会发现电路电阻返回到其初始的高电平,这表明修改发生在探针的接触位置而不是电路的其他地方。与不同金属的接触研究表明,在我们的样品中,Pd金属与MWCNT的接触电阻最低。

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