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首页> 外文期刊>International Journal of Quantum Chemistry >Electronic and structural properties of C59Si on the monohydride Si(100) surface
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Electronic and structural properties of C59Si on the monohydride Si(100) surface

机译:一价Si(100)表面上C59Si的电子和结构性质

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We propose the use of the Si atom in the C59Si molecule as a possible way to controllably anchor fullerene molecules on an Si surface, due to the formation of a strong bond to one of the Si surface atoms. We considered a monohydride Si(100) surface with the H removed from one of the Si surface atoms, and the C59Si was adsorbed at this site. Through ab initio calculations based on Density Functional Theory, we obtained a final Si-surface-Si-C59Si bond distance of 2.37 angstrom, and a binding energy of -3.0 eV. Considering the reaction H-surface + C59SiH -> (C59Si)(adsorbed) + (H-2)(gas), we find this process to be exothermic by 0.41 eV. Upon adsorption of an isolated molecule, we find four levels in the gap, three empty and one singly occupied, all of them being basically localized at the C59Si molecule. (c) 2005 Wiley Periodicals, Inc.
机译:我们建议在C59Si分子中使用Si原子作为将富勒烯分子可控制地锚定在Si表面的一种可能方式,因为它会与一个Si表面原子形成强键。我们考虑了从一个硅表面原子中除去H的单氢化物Si(100)表面,C59Si吸附在该位置。通过基于密度泛函理论的从头计算,我们得出最终的Si-表面-Si-C59Si键距为2.37埃,结合能为-3.0 eV。考虑到反应H面+ C59SiH->(吸附的C59Si)+(H-2)(气体),我们发现该过程放热0.41 eV。吸附分离出的分子后,我们发现缝隙中有四个能级,三个空位,一个被单独占据,所有这些基本上都位于C59Si分子上。 (c)2005年Wiley Periodicals,Inc.

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