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首页> 外文期刊>International Journal of Quantum Chemistry >Electron transport in nano-gold-silicon interfaces
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Electron transport in nano-gold-silicon interfaces

机译:纳米金-硅界面中的电子传输

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The electron transport characteristics of gold-silicon interfaces are studied using a combined ab initio approach of the Green's function for electron transfer and quantum density functional theory (DFT) for finite and extended systems. The Kohn-Sham Hamiltonian of an extended cluster or molecule and the density of states (DOS) of bulk Si and Au are used to construct the interface Hamiltonian to obtain the DOS, electron transmission, and current-voltage characteristics of the interface. Diode behavior is observed with electron conduction when the gold side is positively biased with a threshold of 0.8 V. The presence of molecules trapped at the interface and the geometry of the metal atoms strongly affect the conductance, implying difficult or even impossible theory-experiment validations. (c) 2006 Wiley Periodicals, Inc.
机译:金-硅界面的电子传输特性是采用格林函数从头算的方法进行电子转移的,而量子密度泛函理论(DFT)则用于有限和扩展系统。利用扩展簇或分子的Kohn-Sham哈密顿量以及块状Si和Au的态密度(DOS)来构造哈密顿量界面,以获得DOS,界面的电子传输和电流-电压特性。当金侧以0.8 V的阈值正向偏置时,会观察到电子行为的二极管行为。界面处捕获的分子的存在和金属原子的几何形状会严重影响电导率,这意味着很难进行甚至是不可能的理论实验验证。 (c)2006年Wiley Periodicals,Inc.

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