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首页> 外文期刊>International Journal of Quantum Chemistry >Fabrication of crystallized boron films by laser ablation
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Fabrication of crystallized boron films by laser ablation

机译:激光烧蚀制备结晶硼膜

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Polycrystalline beta-rhombohedral boron films mixed with amorphous boron phase have been successfully fabricated oil quartz substrates using pulsed laser ablation in a quartz glass tube chamber placed in an electric furnace. The crystallinity of the films strongly depended on the temperature of the furnace and the pressure of background argon gas. High temperature and high pressure in the chamber were suitable for crystallized boron film preparation. The best crystalline films (without B2O3 phase formation) were obtained at 1000degreesC, 100 Pa. XPS measurements demonstrated that the major contaminants were carbon and oxygen, and the atomic ratio of oxygen to boron was 0.05 under the preparation conditions of well-crystallized films. The surface roughness of the films decreased by lowering laser energy to 150 mJ/pulse under the same pressure and temperature conditions. (C) 2003 Elsevier Inc. All rights reserved.
机译:混合有非晶态硼相的多晶β-菱面体硼膜已成功地在置于电炉中的石英玻璃管腔中使用脉冲激光烧蚀法制备了石油石英基板。薄膜的结晶度在很大程度上取决于炉子的温度和背景氩气的压力。室中的高温和高压适合于结晶硼膜的制备。最佳结晶膜(无B2O3相形成)在1000℃,100 Pa下获得。XPS测量表明,在良好结晶膜的制备条件下,主要污染物为碳和氧,氧与硼的原子比为0.05。在相同的压力和温度条件下,通过将激光能量降低至150 mJ /脉冲,可以降低薄膜的表面粗糙度。 (C)2003 Elsevier Inc.保留所有权利。

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