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首页> 外文期刊>International Journal of Quantum Chemistry >Comparative study of LiMn2O4 thin film cathode grown at high, medium and low temperatures by pulsed laser deposition
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Comparative study of LiMn2O4 thin film cathode grown at high, medium and low temperatures by pulsed laser deposition

机译:脉冲激光沉积在高,中,低温下生长的LiMn2O4薄膜阴极的比较研究

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LiMn2O4 thin films with different crystallizations were respectively grown at high, medium and low temperatures by pulsed laser deposition (PLD). Structures, morphologies and electrochemical properties of these three types of thin films were comparatively studied. Films grown at high temperature (>= 873 K) possessed flat and smooth surfaces and were highly crystallized with different textures and crystal sizes depending on the deposition pressure of oxygen. However, films deposited at low temperature (473 K) had rough surfaces with amorphous characteristics. At medium temperature (673 K), the film was found to consist mainly of nano-crystals less than 100 nm with relatively loose and rough surfaces, but very dense as observed from the cross-section. The film deposited at 873 K and 100 mTorr of oxygen showed an initial discharge capacity of 54.3 mu Ah/cm(2) pm and decayed at 0.28% per cycle, while the amorphous film had an initial discharge capacity of 20.2 mu Ah/cm(2) mu m and a loss rate of 0.29% per cycle. Compared with the highly crystallized and the amorphous films, nano-crystalline film exhibited higher potential, more capacity and much better cycling stability. As high as 61 mu Ah/cm(2) mu m of discharge capacity can be achieved with an average decaying rate of only 0.032% per cycle up to 500 cycles. The excellent performance of nano-crystalline film was correlated to its microstructures in the present study. (c) 2006 Published by Elsevier Inc.
机译:通过脉冲激光沉积(PLD)分别在高温,中温和低温下生长具有不同结晶度的LiMn2O4薄膜。对这三种类型的薄膜的结构,形貌和电化学性能进行了比较研究。在高温(> = 873 K)下生长的薄膜具有平坦而光滑的表面,并根据氧气的沉积压力,以不同的质地和晶体尺寸高度结晶。然而,在低温(473 K)下沉积的膜具有粗糙表面,具有非晶特性。在中等温度(673 K)下,发现该膜主要由小于100 nm的纳米晶体组成,具有相对疏松和粗糙的表面,但从横截面观察到非常致密。在873 K和100 mTorr氧气下沉积的薄膜显示出初始放电容量为54.3μAh / cm(2)pm,并在每个周期以0.28%衰减,而非晶膜的初始放电容量为20.2μAh / cm(2)pm。 2)微米,每个周期的损失率为0.29%。与高度结晶的薄膜和非晶薄膜相比,纳米晶体薄膜具有更高的电势,更大的容量和更好的循环稳定性。放电容量高达61μAh/ cm(2)μm,在500个循环中,每个循环的平均衰减率仅为0.032%。在本研究中,纳米晶体薄膜的优异性能与其微观结构有关。 (c)2006年由Elsevier Inc.发布。

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