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首页> 外文期刊>International Journal of Quantum Chemistry >KINETIC MECHANISM OF REACTION BETWEEN TT-PHASE NIOBIUM OXIDE AND CARBON TETRACHLORIDE (CCL4)
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KINETIC MECHANISM OF REACTION BETWEEN TT-PHASE NIOBIUM OXIDE AND CARBON TETRACHLORIDE (CCL4)

机译:TT相氧化铌与四氯化碳(CCL4)反应的动力学机理

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摘要

The kinetic mechanism of reaction between TT-phase niobium oxide and carbon tetrachloride (CCl4) at low (453 K) and high (above 573 K) temperatures was investigated. The reaction of the TT-phase niobium oxide with CCl4 at 453 K was controlled by the diffusion of CCl4 through the outer layer of the reaction product, NbOCl3, formed around the surface. For the reaction at temperatures above 573 K, the chemical reaction on the surface of the niobium oxide controls the total reaction rate due to the disappearance of the layer of NbOCl3. (C) 1995 Academic Press, Inc. [References: 6]
机译:研究了TT相氧化铌与四氯化碳(CCl4)在低温(453 K)和高温(573 K以上)之间反应的动力学机理。 TT相氧化铌与CCl4在453 K的反应是通过CCl4扩散穿过表面周围形成的反应产物NbOCl3的外层来控制的。对于高于573 K的温度下的反应,由于NbOCl3层的消失,铌氧化物表面的化学反应控制了总反应速率。 (C)1995 Academic Press,Inc. [参考:6]

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