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首页> 外文期刊>International journal of nonlinear sciences and numerical simulation >Multiscale Simulation of Wedge Nanoindentation Based on the Repulsive Force-field Approach
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Multiscale Simulation of Wedge Nanoindentation Based on the Repulsive Force-field Approach

机译:基于排斥力场方法的楔形纳米压痕多尺度模拟

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摘要

A new method is proposed to perform the multiscale simulation of nanoindentation with wedge indenter. We designed a potential field to model the wedge indenter based on the repulsive force-field approach which was used to model round indenters. A smooth curve representing the indenter tip is used to avoid the singularity of an ideal wedge indenter. Simulation with our approach correctly shows essential features of wedge nanoindentation. The load responses during retraction is confirmed by elastic model based on the Oliver-Pharr approach. Significant indentation size effect that the contact hardness decreases with the increase of contact depth is compared with existing models. The atomic configurations of the film shows that perfect dislocations nucleate under the indenter with Burges vectors perpendicular to the indentation direction. The strain distribution under the indenter shows that the length of plastic zone in the indentation direction is much larger than the contact width.
机译:提出了一种利用楔形压头对纳米压痕进行多尺度模拟的新方法。我们基于排斥力场方法设计了一个用于对楔形压头进行建模的势场,该方法用于对圆形压头进行建模。使用代表压头尖端的平滑曲线来避免理想楔形压头的奇异性。用我们的方法进行的模拟正确显示了楔形纳米压痕的基本特征。通过基于Oliver-Pharr方法的弹性模型确认缩回期间的载荷响应。与现有模型相比,压痕尺寸效应显着,即接触硬度随接触深度的增加而降低。薄膜的原子构型表明,在垂直于压痕方向的Burges矢量的作用下,完美的位错在压痕下成核。压头下的应变分布表明,压痕方向上的塑性区长度远大于接触宽度。

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