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Properties of titanium dioxide films prepared by reactive electron-beam evaporation from various starting materials

机译:通过各种原料的反应性电子束蒸发制备的二氧化钛薄膜的性能

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There is a wide choice of starting materials for the production of titanium dioxide films by reactive electron-beam evaporation. We have investigated the specific merits of these materials in terms of refractive index, stress, and abrasion resistance of the resultant titanium dioxide films. The suboxides TiO, Ti2O3, and Ti3O5 as well as titanium dioxide and titanium metal were reactively evaporated, and titanium dioxide films free of absorption were obtained on substrates at 25 and 250 degreesC. On unheated substrates the refractive index, which varies from 2.06 to 2.22, the stress, and the abrasion resistance all depend on the starting material used. On substrates heated to 250 degreesC the refractive indices of all films lie closely about 2.4, and all films show high tensile stress and good abrasion resistance. (C) 2002 Optical Society of America. [References: 40]
机译:通过反应性电子束蒸发生产二氧化钛薄膜的原料有多种选择。我们已经研究了这些材料在所得二氧化钛薄膜的折射率,应力和耐磨性方面的特殊优点。反应性蒸发低价氧化物TiO,Ti2O3和Ti3O5以及二氧化钛和钛金属,并在25和250摄氏度的基板上获得无吸收的二氧化钛薄膜。在未加热的基材上,折射率在2.06至2.22之间变化,应力和耐磨性均取决于所用的起始材料。在加热到250摄氏度的基材上,所有薄膜的折射率都接近于2.4,并且所有薄膜均显示出高拉伸应力和良好的耐磨性。 (C)2002年美国眼镜学会。 [参考:40]

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