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Simultaneous measurement of surface geometry and material distribution by focusing ellipsotopometry

机译:通过聚焦椭圆形仪同时测量表面几何形状和材料分布

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摘要

A new method for total surface measurement based on reflection ellipsometry is presented. By scanning the surface of the target under test with a focused laser beam, one can measure the surface topography and its material distribution simultaneously with high lateral resolution. Target topography is determined by ellipsometric measurement of local gradient angles γ_(x) and γ_(y) of the target's scanned surface elements. To identify the material, one measures the local complex refractive index n, too. The influence of beam focusing on the measurement results is discussed. We describe successful tests with various dielectric and metallic surfaces by use of He-Ne (632-nm) and He-Cd (442-nm) lasers.
机译:提出了一种基于反射椭圆仪的全表面测量新方法。通过用聚焦的激光束扫描被测目标的表面,可以同时以高横向分辨率测量表面形貌及其材料分布。通过椭偏测量目标的扫描表面元素的局部梯度角γ_(x)和γ_(y)可以确定目标的形貌。为了识别材料,也可以测量局部复折射率n。讨论了光束聚焦对测量结果的影响。我们描述了使用He-Ne(632-nm)和He-Cd(442-nm)激光器在各种介电和金属表面上的成功测试。

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