Improved analyzer multilayers for aluminium and boron detection with x-ray fluorescence

摘要

We have developed improved analyzer multilayers for the detection of aluminium (Al) and boron (B) on silicon (Si) wafers with wavelength-dispersive x-ray fluorescence spectrometers. For the detection of Al on Si wafers we show that WSi_(2)/Si and Ta/Si multilayers provide detection limits that are 42% and 60% better, respectively, than with currently used W/Si multilayers. For the detection of B on Si wafers we show that La/B_(4)C multilayers improve the detection limit by～28% compared with a conventionally used Mo/B_(4)C multilayer.