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Characterization of sputtered nickel/carbon multilayers with soft-x-ray reflectivity measurements

机译:用软X射线反射率测量表征溅射的镍/碳多层膜

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Several sputtered Ni/C;multilayer mirrors with periods between 3.8 and 6.0 nm were investigated with the HASYLAB reflectometer to determine the peak reflectivity and the internal structure of the multilayers. The enhanced reflectivity in the Bragg maximum, especially below 284 eV (carbon K edge), is interesting for practical applications. For both materials (Ni and C), the optical constants were previously obtained from angular-dependent reflectivity measurements. The layer thicknesses, interface roughnesses, and mean thickness errors of multilayer mirrors are obtained from least-squares fits of theoretical reflectivity curves. A model is presented to describe the influence of interface roughness on other parameters obtained from the analysis. All Ni/C multilayers, with Ar as the sputter gas, were produced in the low-pressure triode-assisted sputtering facility of Sincrotrone Trieste. (C) 1997 Optical Society of America.
机译:使用HASYLAB反射计研究了几个周期在3.8至6.0 nm之间的溅射Ni / C;多层反射镜,以确定峰值反射率和多层的内部结构。布拉格最大值中的增强反射率,特别是在284 eV以下(碳K边缘),对于实际应用而言非常有趣。对于这两种材料(Ni和C),光学常数以前都是通过角度相关的反射率测量获得的。从理论反射率曲线的最小二乘拟合获得多层反射镜的层厚度,界面粗糙度和平均厚度误差。提出了一个模型来描述界面粗糙度对从分析中获得的其他参数的影响。所有以Ar为溅射气体的Ni / C多层膜都是在Sincrotrone Trieste的低压三极管辅助溅射设备中生产的。 (C)1997年美国眼镜学会。

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