SURVEY OF TI-, B-, AND Y-BASED SOFT X-RAY-EXTREME ULTRAVIOLET MULTILAYER MIRRORS FOR THE 2- TO 12-NM WAVELENGTH REGION

摘要

We have performed an experimental investigation of Ti-, B4C-, B-, and Y-based multilayer mirrors for the soft x-ray-extreme ultraviolet (XUV) wavelength region between 2.0 and 12.0 nm. Eleven different material pairs were studied: Ti/Ni, Ti/Co, Ti/Cu, Ti/W, B4C/Pd, B/Mo, Y/Pd, Y/Ag, Y/Mo, Y/Nb, and Y/C. The multilayers were sputter deposited and were characterized with a number of techniques, including low-angle x-ray diffraction and normal incidence XUV reflectometry. Among the Ti-based multilayers the best results were obtained with Ti/W, with peak reflectances up to 5.2% at 2.79 nm at 61 degrees from normal incidence. The B4C/Pd and B/Mo multilayer mirrors had near-normal incidence (5 degrees) peak reflectances of 11.5% at 8.46 nm and 9.4% at 6.67 nm, respectively, whereas a Y/Mo multilayer mirror had a maximum peak reflectance of 25.6% at 11.30 nm at the same angle. The factors limiting the peak reflectance of these different multilayer mirrors are discussed. (C) 1996 Optical Society of America [References: 61]