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Ellipsometric study of thermally evaporated germanium thin film

机译:热蒸发锗薄膜的椭偏研究

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The optical properties of thermally evaporated germanium thin films in the spectral range 0.3-1.7 mu m were studied with spectroscopic ellipsometry. The microstructure of these films, including their crystallinity, density, surface morphology, and surface oxidation, was analyzed with x-ray diffraction, Rutherford backscattering spectrometry, atomic force microscopy (AFM), and Auger electron spectrometry (AES). Parameters such as the surface roughness and surface-oxidation-layer thickness, derived from AFM and AES measurements, were incorporated into our optical model. The complex index of refraction (n and k) of the films was determined throughout the above spectral range and compared with that of single-crystal germanium. (C) 1991 Optical Society of America.
机译:用椭圆偏振光谱法研究了在0.3-1.7μm光谱范围内的热蒸发锗薄膜的光学特性。使用X射线衍射,卢瑟福背散射光谱,原子力显微镜(AFM)和俄歇电子能谱(AES)分析了这些薄膜的微观结构,包括其结晶度,密度,表面形态和表面氧化。由AFM和AES测量得出的表面粗糙度和表面氧化层厚度等参数已纳入我们的光学模型中。在上述整个光谱范围内测定薄膜的复折射率(n和k),并将其与单晶锗的复折射率进行比较。 (C)1991年美国眼镜学会。

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