Comparison of the exposure characteristics of soft-x-ray film SIOFM-5FW with Kodak 101-05 and llford Q-plates

摘要

In identical exposure and processing conditions, we compare the exposure characteristics of soft-x-ray film, SIOFM-5FW, with Kodak101-05 and Ilford Q-plates in the soft-x-ray and extreme LTV region below 100 nm. using D-19 and Phenisol developers. The experimental results show that for radiation greater than 10 nm. the response of SIOFM-5FW lies between the Kodak101-05 and the Ilford Q-plates but is closer to the former. For radiation of less than 10 nm, the SIOFM-5FW is more sensitive than the Kodak101-05 plate, with a higher saturated optical density, a higher dynamic range, and an obvious carbon K absorption edge structure in the spectra obtained. The effects of the two developers used on the exposure characteristics are discussed. # 1997 Optical Society of America