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Multiangle Imaging Spectroradiometer: optical characterization of the calibration panels

机译:多角度成像光谱仪:校准板的光学特性

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The reflectance properties of an engineering model (EM) of the Spectralon panel intended for use within, an on-board calibrator (OBC) on the NASA Multiangle Imaging Spectroradiometer (MISR) instrument have been fully characterized with regard to panel uniformity and isotropy in response to three incident laser wavelengths of 442, 632.8, and 859.9 nm. A regional variation in the relative bidirectional reflectance factor (RBRF) across the surface of the EM panel, which contributes to spatial nonuniformity at the ±2% level, has been measured at all three laser wavelengths. Further, a reflectance anisotropy has been identified. The mechanism causing these departures from the ideal Lambertian surface may originate in the sanding of the Spectralon surface in the final stage of preparation. This supposition is corroborated by measurements made on a pressed polytetrafluoroethylene (PTFE) panel in which a greatly reduced anisotropy in panel RBRF is measured. The EM panel RBRF exhibits a deviation from Lambertian characteristics as an off-specular peak in the forward scattering direction. A common crossover point at an angle of reflection of ~37° at which the BRF is constant within ±0.4% for an illumination angle range of θ↓(i) = 30°-60° is observed at all three wavelengths. Two Spectralon proto-flight panels that were fabricated after the EM was studied were also the subject of a uniformity study over part of the area of the Spectralon panels at the 442-nm wavelength. The analysis indicated that the panel uniformity satisfies the ±0.5% criterion, which indicates improved panel preparation. However, the off-specular peak in the forward scattering direction was essentially unchanged, with the crossover point at ~37°.# 1997 Optical Society of America
机译:打算在NASA多角度成像光谱仪(MISR)仪器上的板载校准器(OBC)中使用的Spectralon面板的工程模型(EM)的反射特性已就面板的均匀性和响应各向同性进行了充分表征到442、632.8和859.9 nm的三个入射激光波长。已在所有三个激光波长下测量了整个EM面板表面的相对双向反射系数(RBRF)的区域变化,该变化在±2%的水平上导致空间不均匀性。此外,已经确定了反射率各向异性。导致这些偏离理想朗伯表面的机理可能是在准备的最后阶段对Spectralon表面进行了打磨。通过在压制的聚四氟乙烯(PTFE)面板上进行的测量来证实这种假设,其中测量了面板RBRF中的各向异性大大降低。 EM面板RBRF在正向散射方向上呈现出偏离镜面的峰值的朗伯特性。在所有三个波长下,在θ↓(i)= 30°-60°的照明角度范围内,在〜37°的反射角处BRF恒定在±0.4%内的常见交叉点被观察到。在研究了EM之后,制造了两个Spectralon原型飞行面板,这也是在442 nm波长的Spectralon面板的部分区域上进行均匀性研究的主题。分析表明,面板均匀性满足±0.5%的标准,表明面板的制备有所改善。但是,前向散射方向上的镜外峰基本不变,交叉点为〜37°。#1997美国光学学会

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