C/Si multilayer mirrors for the 25-30-nm wavelength region

摘要

We report a new material combination, C/Si, for normal-incidence multilayer mirrors in the wavelength region 25-30 nm. The multilayers, fabricated by ion-beam-sputtering deposition, were characterized by near-normal-incidence reflectance measurements by using a discharge source and a grazing-incidence monochromator. The highest measured near-normal-incidence reflectance was R = 23% (25.6 nm), R = 20% (28.3 nm), R = 25% (30.4 nm) at incident angles of 10°, 12°, and 4°, respectively. The multilayers were also characterized by transmission electron microscopy, which revealed sharp layer interfaces and low interfacial roughness. # 1997 Optical Society of America