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Applicability conditions of the Kubelka-Munk theory

机译:Kubelka-Munk理论的适用条件

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摘要

The description of optical properties of light-scattering materials has made extensive use of radiative transfer models. One of the most successful and simplest models is that of Kubelka and Munk (KM). With this model, optical properties of particulate films under diffuse illumination can be predicted from effective absorption and scattering coefficients of the material. We consider the applicability conditions of this kind of model. An extended KM model for the case of perpendicular collimated illumination is compared with results from a more general four-flux approach, and the differences between them are characterized in terms of a correction factor that depends on particle scattering and absorption, concentration of the scatterers, and film thickness. It is proved formally that the extended KM model under perpendicular illumination is a good approximation for the cases of optically thick films that contain weakly or nonabsorbing particles. (C) 1997 Optical Society of America.
机译:对光散射材料的光学特性的描述已广泛使用了辐射传递模型。最成功和最简单的模型之一是Kubelka和Munk(KM)的模型。利用该模型,可以从材料的有效吸收和散射系数预测在漫射照明下颗粒膜的光学性能。我们考虑这种模型的适用条件。将垂直准直照明情况下的扩展KM模型与更通用的四通量方法的结果进行比较,并根据校正因子来表征它们之间的差异,校正因子取决于粒子的散射和吸收,散射体的浓度,和膜厚。正式证明在垂直照明下的扩展KM模型对于包含较弱或不吸收颗粒的光学厚膜的情况是很好的近似。 (C)1997年美国眼镜学会。

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