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Birefringence imaging with imperfect benches: application to large-scale birefringence measurements

机译:具有不完善工作台的双折射成像:在大规模双折射测量中的应用

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摘要

We describe a birefringence measurement bench that allows fast two-dimensional measurements of low-birefringence fields in large transparent samples. We present calculations that show that, even when a birefringence bench exhibits defects (nonideal components, misalignments, etc.), measurements can be performed under realistic conditions without any a priori knowledge of the origin of the bench defects. This allows the measurement of birefringence fields on large-scale samples by use of an array of detectors instead of a single detector element, with a sensitivity of 3×10~(-4) rad for 2-s data integration.
机译:我们描述了一种双折射测量平台,该平台可以对大型透明样本中的低双折射场进行快速的二维测量。我们提供的计算结果表明,即使双折射工作台显示出缺陷(非理想分量,未对准等),也可以在实际条件下进行测量,而无需任何先验知识即可知道工作台缺陷的起源。这允许通过使用探测器阵列而不是单个探测器元件来测量大型样本上的双折射场,对于2 s数据积分,灵敏度为3×10〜(-4)rad。

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