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LASER CONDITIONING OF LAF3/MGF2 DIELECTRIC COATINGS AT 248 NM

机译:LAF3 / MGF2介电涂层在248 NM的激光条件

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摘要

Highly reflective LaF3/MgF2 systems for a wavelength of 248 nm on MgF2 and crystalline quartz substrates were investigated. The influence of laser conditioning on damage threshold and absorptance was remarkable in those coatings that had a high initial absorptance. Monitoring with a laser calorimeter revealed the conditioning effect to be a function of the irradiation dose rather than of energy density or pulse rate. Furthermore, x-ray photoelectron spectroscopy and transmission electron microscopy showed that conditioning induces stoichiometric and structural changes in the multilayers, especially in near-surface sublayers, whereas scanning electron microscopy and atomic force microscopy investigations indicated that the surface remains unchanged. (C) 1996 Optical Society of America [References: 27]
机译:研究了在MgF2和晶体石英衬底上波长为248 nm的高反射LaF3 / MgF2系统。激光调节对损伤阈值和吸收率的影响在那些具有高初始吸收率的涂层中是很明显的。用激光量热计监测表明,调节效果是辐照剂量的函数,而不是能量密度或脉冲率的函数。此外,X射线光电子能谱和透射电子显微镜表明,调理会引起多层结构的化学计量和结构变化,特别是在近表面亚层,而扫描电子显微镜和原子力显微镜研究表明表面保持不变。 (C)1996年美国眼镜学会[参考文献:27]

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