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Photolytic fabrication of phase gratings on silver halide crystals

机译:在卤化银晶体上光解相位光栅

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摘要

Diffraction phase gratings are formed on samples of crystalline silver halide by exposing them through a mask to 353-nm laser light followed by chemical processing. The exposure and photographic development processes generate metallic silver strips on the sample surface. The fixing process removes the silver strips, leaving grooves on the surface as deep as 1.1 μm. Gratings of 100-μm period are thus formed. The groove depth is determined by optical methods and is confirmed by atomic force microscopy. This method can be used to form diffractive optical elements on IR transmitting fibers and waveguides as well as on crystals.
机译:衍射相位光栅通过在掩模上暴露于353 nm激光中并随后进行化学处理,从而在结晶卤化银样品上形成。曝光和照相显影过程会在样品表面产生金属银条。固定过程去除了银带,在表面上留下了深至1.1μm的凹槽。由此形成了100μm周期的光栅。凹槽深度通过光学方法确定并通过原子力显微镜确认。该方法可用于在红外传输纤维和波导以及晶体上形成衍射光学元件。

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