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首页> 外文期刊>Applied optics >ELECTRON-TRAPPING MATERIALS AND ELECTRON-BEAM-ADDRESSED ELECTRON-TRAPPING MATERIAL DEVICES - AN IMPROVED MODEL
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ELECTRON-TRAPPING MATERIALS AND ELECTRON-BEAM-ADDRESSED ELECTRON-TRAPPING MATERIAL DEVICES - AN IMPROVED MODEL

机译:电子陷阱材料和电子束地址电子陷阱材料装置-改进模型

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摘要

An improved model governing the dynamics of electron-trapping materials (ETM's) under simultaneous illumination of blue and IR light is developed. The new model takes into account previously neglected effects, such as electron-trap-density saturation and dependence of electron-trapping efficiency on the existing level of trapped-electron density. Inclusion of both effects in a model is vitally important for effective use of ETM's in optoelectronic neurocomputing with pulsating neurons. Experimental verification of the new model is given. General issues of addressing ETM's with an electron beam are also studied, and a general design equation for electron-beam-addressed ETM devices is developed. In particular, two electron-beam-addressed ETM devices that are of special interest, the field-emission microcathode ETM spatial light modulator and the ETM-based image intensifier, are presented. [References: 27]
机译:建立了一种改进的模型,该模型可以控制蓝色和红外光同时照射下的电子陷阱材料(ETM)的动力学。新模型考虑了以前被忽略的影响,例如电子陷阱密度饱和和电子陷阱效率对现有电子陷阱密度水平的依赖性。在模型中包含这两种效应对于在脉动神经元的光电神经计算中有效使用ETM至关重要。对新模型进行了实验验证。还研究了用电子束寻址ETM的一般问题,并开发了用于电子束寻址ETM装置的通用设计方程。特别是,提出了两个特别受关注的电子束寻址ETM设备,即场发射微阴极ETM空间光调制器和基于ETM的图像增强器。 [参考:27]

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