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首页> 外文期刊>Angewandte Chemie >Shear Patterning of Microdominos: A New Class of Procedures for Making Micro- and Nanostructures
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Shear Patterning of Microdominos: A New Class of Procedures for Making Micro- and Nanostructures

机译:Microdominos的剪切模式:制作微结构和纳米结构的一类新程序

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摘要

This paper describes the preparation of fields of micrometer-scale pillars (microdominos), and the tipping of these pillars onto their sides by shearing. Previously, the repositioning of micrometer-scale features has focused on the use of surface tension forces to bring features out-of-plane (e.g., mirrors in microelectromechanical systems, or MEMS), or to align in-plane features. Figure 1 illustrates our approach schematically, and gives a representative result showing the uniformity of the process. This process provides a route to repetitive 3D microstructures that would be difficult or impossible to prepare by conventional microanolithography. Since the top surfaces of these pillars can be coated with nanometer-thick films by evaporation, tipping also provides a method of generating regular arrays of features with nanometer-scale lateral dimensions in-plane. Although the use of thin-film deposition techniques to generate features with functional, nanoscale edges is well established, this method provides a simple route to arrays of nanoscale edges that can be addressed electrically.
机译:本文介绍了微米级支柱(microdominos)的准备工作,以及通过剪切将这些支柱倾斜到其侧面的方法。以前,微米级特征的重新定位已集中在表面张力的使用上,以使特征脱离平面(例如,微机电系统或MEMS中的镜子),或对齐平面内特征。图1示意性地说明了我们的方法,并给出了表示过程均匀性的代表性结果。该工艺提供了通往重复的3D微观结构的途径,而传统的微观/纳米光刻技术很难或不可能制备这些重复的3D微观结构。由于可以通过蒸发在这些柱的顶表面涂上纳米级的薄膜,因此倾斜处理还提供了一种生成规则的特征阵列的方法,这些阵列的特征是在平面内具有纳米级的横向尺寸。尽管已经很好地建立了使用薄膜沉积技术来生成具有功能性,纳米级边缘的特征的方法,但是该方法提供了一种可通过电方式寻址的纳米级边缘阵列的简单方法。

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