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Observation of Room-Temperature Magnetoresistance in Monolayer MoS2 by Ferromagnetic Gating

机译:铁磁门控蒙诺勒MOS2室温磁阻观察

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摘要

Room-temperature magnetoresistance (MR) effect is observed in heterostructures of wafer-scale MoS2 layers and ferromagnetic dielectric CoFe2O4 (CFO) thin films. Through the ferromagnetic gating, an MR ratio of 12.7% is experimentally achieved in monolayer MoS2 under 90 kOe magnetic field at room temperature (RT). The observed MR ratio is much higher than that in previously reported nonmagnetic metal coupled with ferromagnetic insulator, which generally exhibited MR ratio of less than 1%. The enhanced MR is attributed to the spin accumulation at the heterostructure interface and spin injection to the MoS2 layers by the strong spin orbit coupling effect. The injected spin can contribute to the spin current and give rise to the MR by changing the resistance of MoS2 layers. Furthermore, the MR effect decreases as the thickness of MoS2 increases, and the MR ratio becomes negligible in MoS2 with thickness more than 10 layers. Besides, it is interesting to find a magnetic field direction dependent spin Hall magnetoresistance that stems from a combination of the spin Hall and the inverse spin Hall effects. Our research provides an insight into exploring RT MR in monolayer materials, which should be helpful for developing
机译:在晶片级MOS2层的异质结构和铁磁性介电COFE2O4(CFO)薄膜的异质结构中观察室温磁阻(MR)效应。通过铁磁门,在室温(RT)下在90只Koe磁场下的单层MOS2中实验地实现12.7%的MR比。观察到的MR比远高于先前报道的非磁性金属与铁磁绝缘体偶联,这通常表现出小于1%的MR比。增强的MR归因于异质结构界面处的旋转累积,并通过强的自旋轨道耦合效果自旋注射到MOS2层。注入的旋转可以促进旋转电流,通过改变MOS2层的电阻来产生MR。此外,随着MOS2的厚度增加,MR效应降低,并且MR比在MOS2中可忽略不计,厚度大于10层。此外,有趣的是找到一种磁场方向依赖性旋转霍米磁阻,其源于旋转大厅和逆旋转霍尔效应的组合。我们的研究提供了探索探索单层材料的RT先生,这应该有助于发展

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