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Tuning Electrical Conductance in Bilayer MoS2 through Defect-Mediated Interlayer Chemical Bonding

机译:通过缺陷介导的层间化学键合调节双层MOS2的电导

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摘要

Interlayer interaction could substantially affect the electrical transport in transition metal dichalcogenides, serving as an effective way to control the device performance. However, it is still challenging to utilize interlayer interaction in weakly interlayer-coupled materials such as pristine MoS_(2) to realize layer-dependent tunable transport behavior. Here, we demonstrate that, by substitutional doping of vanadium atoms in the Mo sites of the MoS_(2) lattice, the vanadium-doped monolayer MoS_(2) device exhibits an ambipolar field effect characteristic, while its bilayer device demonstrates a heavy p -type field effect feature, in sharp contrast to the pristine monolayer and bilayer MoS_(2) devices, both of which show similar n -type electrical transport behaviors. Moreover, the electrical conductance of the doped bilayer MoS_(2) device is drastically enhanced with respect to that of the doped monolayer MoS_(2) device. Employing first-principle calculations, we reveal that such striking behaviors arise from the presence of electrical transport networks associated with the enhanced interlayer hybridization of S-3p_(z ) orbitals between adjacent layers activated by vanadium dopants in the bilayer MoS_(2), which is nevertheless absent in its monolayer counterpart. Our work highlights that the effect of dopant not only is confined in the in-plane electrical transport behavior but also could be used to activate out-of-plane interaction between adjacent layers in tailoring the electrical transport of the bilayer transitional metal dichalcogenides, which may bring different applications in electronic and optoelectronic devices.
机译:中间层相互作用可能基本上影响过渡金属二甲基甲基化物中的电气传输,用作控制器件性能的有效方法。然而,利用诸如原始MOS_(2)的弱层间耦合材料中的层间相互作用仍然具有挑战性,以实现依赖层依赖的可调谐传输行为。在这里,我们证明,通过在MOS_(2)晶格的MO位点中的钒原子的钒原子的替代掺杂,钒掺杂的单层MOS_(2)器件表现出AMPOLAR场效应特性,而其双层装置表现出沉重的 P型现场效果特征,与原始单层和双层MOS_(2)器件鲜明对比,两者都显示出类似的 N型电气传输行为。此外,掺杂双层MOS_(2)装置的电导相对于掺杂的单层MOS_(2)装置的装置大大提高。采用第一原理计算,我们揭示了这种引人注目的行为,从与通过双层掺杂剂在双层MOS_(2 ),仍然在其单层对应上缺席。我们的工作凸显了掺杂剂的效果不仅限于面内电传输行为,而且还可用于激活相邻层之间的平面外相互作用,以定制双层过渡金属二甲基甲基化物的电气传输在电子和光电器件中带来不同的应用。

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  • 来源
    《ACS nano》 |2020年第8期|共11页
  • 作者单位

    National Laboratory of Solid State Microstructures School of Physics Collaborative Innovation Center of Advanced Microstructures Nanjing University;

    Department of Physics Southern University of Science and Technology;

    Department of Physics Southern University of Science and Technology;

    National Laboratory of Solid State Microstructures School of Physics Collaborative Innovation Center of Advanced Microstructures Nanjing University;

    National Laboratory of Solid State Microstructures School of Physics Collaborative Innovation Center of Advanced Microstructures Nanjing University;

    National Laboratory of Solid State Microstructures School of Physics Collaborative Innovation Center of Advanced Microstructures Nanjing University;

    National Laboratory of Solid State Microstructures School of Physics Collaborative Innovation Center of Advanced Microstructures Nanjing University;

    National Laboratory of Solid State Microstructures School of Physics Collaborative Innovation Center of Advanced Microstructures Nanjing University;

    Department of Physics Southern University of Science and Technology;

    National Laboratory of Solid State Microstructures School of Physics Collaborative Innovation Center of Advanced Microstructures Nanjing University;

    Department of Physics Southern University of Science and Technology;

    National Laboratory of Solid State Microstructures School of Physics Collaborative Innovation Center of Advanced Microstructures Nanjing University;

    National Laboratory of Solid State Microstructures School of Physics Collaborative Innovation Center of Advanced Microstructures Nanjing University;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 分子物理学、原子物理学;
  • 关键词

    bilayer MoSlt; subgt; 2lt; /subgt; vanadium doping; interlayer interaction; electrical conductance; chemical bonding;

    机译:双层MOS<亚>2</ sub>钒掺杂;层间相互作用;电导;化学键合;

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