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Second Time-Scale Synthesis of High-Quality Graphite Films by Quenching for Effective Electromagnetic Interference Shielding

机译:通过淬火进行有效电磁干扰屏蔽的第二次刻度合成高质量石墨膜

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摘要

Graphite film has many remarkable properties and intriguing applications from energy storage, electromagnetic interference (EMI) shielding, and thermal management to ultraviolet lithography. However, the existing synthesis methods require an extremely high processing temperature of similar to 3000 degrees C and/or long processing time of typically hours. Here, we report an ultrafast synthesis of tens of nanometer-thick high-quality graphite films within a few seconds by quenching a hot Ni foil in ethanol. The vertical growth rate can reach over 64 nm s(-1), which is more than 2 orders of magnitude higher than those of the existing methods. Moreover, the films show excellent electrical conductivity (similar to 2.6 X 10(5) S/m) and mechanical strength (similar to 110 MPa) comparable to or even better than those synthesized by chemical vapor deposition. As an example, we demonstrate the potential of these graphite films for effective EMI shielding, which show a record absolute shielding effectiveness of 481,000 dB cm(2) g(-1), outperforming all the reported synthetic materials.
机译:石墨膜具有许多显着的性能和来自储能,电磁干扰(EMI)屏蔽和热管理到紫外线的迷人应用。然而,现有的合成方法需要极高的加工温度与3000摄氏度和/或通常为30小时的处理时间。在这里,我们通过在乙醇中淬火热Ni箔来在几秒钟内报告几十纳米厚的高质量石墨膜的超快合成。垂直生长速率可以达到超过64nm的(-1),比现有方法高于2的数量级。此外,薄膜显示出优异的电导率(类似于2.6×10(5)s / m)和与通过化学气相沉积合成的那些相当的机械强度(类似于110MPa)。作为一个例子,我们证明了这些石墨膜的潜力,用于有效的EMI屏蔽,其显示出481,000dB(2)G(-1)的记录绝对屏蔽效果,优于所有报告的合成材料。

著录项

  • 来源
    《ACS nano》 |2020年第3期|共8页
  • 作者单位

    Chinese Acad Sci Inst Met Res Shenyang Natl Lab Mat Sci Shenyang 110016 Peoples R China;

    Chinese Acad Sci Inst Met Res Shenyang Natl Lab Mat Sci Shenyang 110016 Peoples R China;

    Northeastern Univ Sch Mat Sci &

    Engn Key Lab Anisotropy &

    Texture Mat MOE Shenyang 110819 Peoples R China;

    Chinese Acad Sci Inst Met Res Shenyang Natl Lab Mat Sci Shenyang 110016 Peoples R China;

    Chinese Acad Sci Inst Met Res Shenyang Natl Lab Mat Sci Shenyang 110016 Peoples R China;

    Chinese Acad Sci Inst Met Res Shenyang Natl Lab Mat Sci Shenyang 110016 Peoples R China;

    Chinese Acad Sci Inst Met Res Shenyang Natl Lab Mat Sci Shenyang 110016 Peoples R China;

    Chinese Acad Sci Inst Met Res Shenyang Natl Lab Mat Sci Shenyang 110016 Peoples R China;

    Northeastern Univ Sch Mat Sci &

    Engn Key Lab Anisotropy &

    Texture Mat MOE Shenyang 110819 Peoples R China;

    Chinese Acad Sci Inst Met Res Shenyang Natl Lab Mat Sci Shenyang 110016 Peoples R China;

    Chinese Acad Sci Inst Met Res Shenyang Natl Lab Mat Sci Shenyang 110016 Peoples R China;

    Chinese Acad Sci Inst Met Res Shenyang Natl Lab Mat Sci Shenyang 110016 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 分子物理学、原子物理学;
  • 关键词

    graphite film; liquid carbon source quenching; electrical conductivity; mechanical strength; flexible electromagnetic interference shielding;

    机译:石墨膜;液体碳源淬火;电导率;机械强度;柔性电磁干扰屏蔽;

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