...
首页> 外文期刊>ACS nano >Explicit Gain Equations for Single Crystalline Photoconductors
【24h】

Explicit Gain Equations for Single Crystalline Photoconductors

机译:单晶光电导体的显式增益方程

获取原文
获取原文并翻译 | 示例
           

摘要

Photoconductors based on semiconducting thin films, nanowires, and two-dimensional atomic layers have been extensively investigated in the past decades. However, there is no explicit photogain equation that allows for fitting and designing photoresponses of these devices. In this work, we managed to derive explicit photogain equations for silicon nanowire photoconductors based on experimental observations. The silicon nanowires were fabricated by patterning the device layer of silicon-on-insulator wafers by standard lithography that were doped with boron at a concentration of similar to 8.6 X 10(17) cm(-3). It was found that the as-fabricated silicon nanowires have a surface depletion region similar to 32 nm wide. This depletion region protects charge carriers in the channel from surface scatterings, resulting in the independence of charge carrier mobilities on nanowire size. Under light illumination, the depletion region logarithmically narrows down, and the nanowire channel widens accordingly. Photo Hall effect measurements show that the nanowire photoconductance is not contributed by the increase of carrier concentrations but by the widening of the nanowire channel. As a result, a nanowire photoconductor can be modeled as a resistor in connection with floating Schottky junctions near the nanowire surfaces. Based on the photoresponses of a Schottky junction, we derived explicit photogain equations for nanowire photoconductors that are a function of light intensity and device physical parameters. The gain equations fit well with the experimental data, from which we extracted the minority carrier lifetimes as tens of nanoseconds, consistent with the minority carrier lifetime in nanowires reported in literature.
机译:在过去几十年中,基于半导体薄膜,纳米线和二维原子层的光电导体已被广泛研究。然而,没有明确的光致相片等式,其允许拟合和设计这些设备的光响应。在这项工作中,我们设法基于实验观察导出用于硅纳米线光电导电器的显式图视图。通过用标准光刻图案化硅式镶嵌晶片的装置层来制造硅纳米线,其浓度为类似于8.6×10(17)cm(-3)的浓度掺杂硼。发现AS制造的硅纳米线具有类似于32nm宽的表面耗尽区。该耗尽区域可保护电荷载体在沟道散射中保护通道中的电荷载体,导致纳米线尺寸的电荷载流子迁移率的独立性。在光照照射下,耗尽区域对数上变窄,纳米线通道相应地变宽。光霍尔效应测量表明,纳米线光电导不通过载流子浓度的增加而贡献,而是通过纳米线通道的加宽来贡献。结果,纳米线光电导体可以用与纳米线表面附近的浮动肖特基结建模的电阻器建模。基于肖特基交界处的光响应,我们为纳米线光电导体衍生出明确的光古古文逻辑方程,其是光强度和器件物理参数的函数。增益方程与实验数据相适合,我们从其中提取为数十纳秒的少数率载体寿命,与文献中报告的纳米线中的少数载体寿命一致。

著录项

  • 来源
    《ACS nano》 |2020年第3期|共9页
  • 作者单位

    Shanghai Jiao Tong Univ Univ Michigan Shanghai Jiao Tong Univ Joint Inst State Key Lab Adv Opt Commun Syst &

    Networks Shanghai 200240 Peoples R China;

    Shanghai Jiao Tong Univ Univ Michigan Shanghai Jiao Tong Univ Joint Inst State Key Lab Adv Opt Commun Syst &

    Networks Shanghai 200240 Peoples R China;

    Xi An Jiao Tong Univ Sch Microelect Xian 710049 Shaanxi Peoples R China;

    Shanghai Jiao Tong Univ Univ Michigan Shanghai Jiao Tong Univ Joint Inst State Key Lab Adv Opt Commun Syst &

    Networks Shanghai 200240 Peoples R China;

    Xi An Jiao Tong Univ Sch Microelect Xian 710049 Shaanxi Peoples R China;

    Shanghai Jiao Tong Univ Univ Michigan Shanghai Jiao Tong Univ Joint Inst State Key Lab Adv Opt Commun Syst &

    Networks Shanghai 200240 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 分子物理学、原子物理学;
  • 关键词

    photoconductor; explicit gain equation; gain mechanism; silicon nanowire; photo Hall effect;

    机译:光电导体;显式增益方程;增益机制;硅纳米线;照片霍尔效果;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号