High-Temperature Continuous-Wave Pumped Lasing from Large-Area Monolayer Semiconductors Grown by Chemical Vapor Deposition

摘要

The realization of low-energy-consumption lasers based on atomically thin two-dimensional (2D) transition metal dichalcogenides (TMDCs) is crucial for the development of optical communications, flexible displays, and lasers on the chip level. However, among the as-demonstrated TMDC-based lasers so far, the gain materials are mainly achieved by a mechanical exfoliation approach accompanied by poor reproducibility and controllability. In this work, we report a controllable design for generating large-scale lasing from chemical vapor deposition (CVD)-derived high-quality monolayer MoS2 film. Strong continuous-wave optically driven whispering-gallery-mode lasing is achieved in a wide temperature range from 77 to 400 K. The eminent lasing performances result from the strong spatial confinement of carriers and the enhanced efficiency of spontaneous emission owing to the lensing and screening effects of silica microsphere cavities. These findings not only advance the fundamental understanding of 2D lasing effects but also provide solutions to fabricate low-cost, scalable, and integratable TMDC-based lasers.