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首页> 外文期刊>ACS nano >Post-Synthesis Modifications of Two-Dimensional MoSe2 or MoTe2 by Incorporation of Excess Metal Atoms into the Crystal Structure
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Post-Synthesis Modifications of Two-Dimensional MoSe2 or MoTe2 by Incorporation of Excess Metal Atoms into the Crystal Structure

机译:通过将过量的金属原子掺入晶体结构中,二维MOSE2或MOTE2的后合成后修饰

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摘要

Phase engineering has extensively been used to achieve metallization of two-dimensional (2D) semiconducting materials, as it should boost their catalytic properties or improve electrical contacts. In contrast, here we demonstrate compositional phase change by incorporation of excess metals into the crystal structure. We demonstrate post-synthesis restructuring of the semiconducting MoTe2 or MoSe2 host material by unexpected easy incorporation of excess Mo into their crystal planes, which causes local metallization. The amount of excess Mo can reach values as high as 10% in MoTe2 thus creating a significantly altered material compared to its parent structure. The incorporation mechanism is explained by density functional theory in terms of the energy difference of Mo atoms incorporated in the line phases as compared to Mo ad-clusters. Angle resolved photoemission spectroscopy reveals that the incorporated excess Mo induces band gap states up to the Fermi level causing its pinning at these electronic states. The incorporation of excess transition metals in MoTe2 and MoSe2 is not limited to molybdenum, but other transition metals can also diffuse into the lattice, as demonstrated experimentally by Ti deposition. The mechanism of incorporation of transition metals in MoSe2 and MoTe2 is revealed, which should help to address the challenges in synthesizing defect-free single layer materials by, for example, molecular beam epitaxy. The easy incorporation of metal atoms into the crystal also indicates that the previously assumed picture of a sharp metal/2D-material interface may not be correct, and at least for MoSe2 and MoTe2, in-diffusion of metals from metal-contacts into the 2D material has to be considered. Most importantly though, the process of incorporation of transition metals with high concentrations into pristine 2D transition-metal dichalcogenides enables a pathway for their post-synthesis modifications and adding functionalities.
机译:相工程广泛用于实现二维(2D)半导体材料的金属化,因为它应该提高它们的催化性质或改善电触点。相反,在这里,我们通过将过量的金属掺入晶体结构中,证明了组成相变化。我们通过意外容易地将过量的Mo掺入它们的晶体平面来证明半导体Mote2或MOSE2主体材料的合成后重组,这导致局部金属化。与其母体结构相比,过量MO的量可以达到高达10%的值,从而产生显着改变的材料。与Mo Ad-簇相比,通过密度函数理论解释了掺入线相中的Mo原子的能量差异的掺入机制。角度分辨的光曝光光谱揭示了掺入的过量的Mo诱导带隙状态直至Fermi水平导致其钉入在这些电子状态下。在MOTE2和MOSE2中掺入过量过渡金属不限于钼,但其他过渡金属也可以扩散到晶格中,如通过Ti沉积实验所示。揭示了在MOSE2和MOTE2中掺入过渡金属的机制,这应该有助于通过例如分子束外延来解决自由缺陷单层材料的挑战。将金属原子易于掺入晶体也表明先前假设的夏普金属/ 2D-材料界面的图像可能不正确,并且至少对于MOSE2和MOTE2,金属的逐渐扩散到2D中。必须考虑材料。然而,最重要的是,将具有高浓度的过渡金属掺入原始2D过渡 - 金属二甲基甲基化物,使其能够进行合成后修饰和添加功能。

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